Thin Film Photoresist
Materials characterization technique for elemental, chemical and molecular characterization of surface contaminants and residues in photoresist applications.
Dry film photoresists are an essential component for photolithography applications. The development and testing of new photo resist solutions requires characterization tools with enhanced surface selectivity. We enable development scientists to investigate the chemical nature and quantity of unwanted contact residues left after removal of the protective applicator layer and to troubleshoot the photoresist process..
The portfolio of Thermo Scientific materials characterization techniques offers elemental and molecular characterization of surface contaminants and residues.