Deposition

Facilitating the elemental quantification of trace metals in high purity semiconductor samples.

For determination of the surface contamination of wafers by chemical and vapor deposition processes, and small sample quantities at very low concentration levels are used in semiconductor industry. The most sensitive analytical instrumentation is required. to carry out routine trace metal quantification at and below the ppt level from sample volumes in the microliter range X-ray spectroscopies enable exacting process control measures and critical defect analysis in the deposition process.