Theta 300

• A high-performance XPS instrument
• Patented Theta technology provides the unique ability to collect angle-resolved XPS spectra over a 60° angular range, in parallel, without tilting the wafer and allows the instrument to characterize ultra-thin films non-destructively
• X-ray monochromator with user-selectable spot size in the range 25µm to 400µm
• Parallel angle-resolved XPS (PARXPS) analysis without tilting the wafer
• Controlled by Avantage, a Windows*-based data system
• CCD sample alignment microscope perpendicular to the sample surface
• Advanced software provides recipe driven measurements and data processing

Lens, Analyzer, and Detector

• Photoelectrons are collected by an electrostatic lens having a large angular acceptance (60°), the Radian lens
• Such a large acceptance angle maximizes sensitivity and allows a large angular range to be collected in PARXPS measurements
• The axis of the lens is 50° from the sample normal and so electrons are collected over the range 20° to 80° (relative to the sample normal)
• The 180° spherical sector analyser is fitted with a two-dimensional detector in the output plane
• The two-dimensional detector provides a means of multi-channel detection, having up to 112 energy channels and up to 96 angular channels

The lens in Theta Probe is unique because it can be operated in either of two modes:

• Conventional mode, for spectroscopy when there is no requirement for angle-resolved information
• Angle-resolving mode

X-ray Source

• All Theta 300 instruments are fitted with a microfocusing monochromator
• User defines the analysis area by selecting the X-ray spot size in the range 25µm to 400µm

Sputter Depth Profiles

• The instrument is equipped with a high-performance ion gun that can be used for conventional sputter depth profiles
• This can be used when the layers are more than a few nanometers thick

Wafer Maps

Full wafer maps of composition and thickness are available from the instrument

Depth Profiling

• The digitally controlled EX05 ion gun can be used to provide excellent depth profiles
• This high-performance ion source can be used even when using low energy ions
• Azimuthal rotation of the sample is available for the ultimate in depth profiling (for wafer pieces and small samples)

Wafer Handling

• Wafers are loaded onto individual carriers that are transported to the analysis position via an intermediate vacuum chamber
• A parking position in the intermediate chamber allows two wafers to be present in the system at any one time

Thermo Scientific surface analysis instruments and components are controlled by the Avantage data system:

• Integrates all aspects of the analysis, including instrument control, data acquisition, data processing and reporting
• Windows based software package which allows remote control via a network and easy interfacing to third party software packages such as Microsoft Word
• Takes care of the total analysis process from sample to report

• Theta 300XT has all of the analytical and measurement capabilities of Theta 300 with the addition of an Equipment Front End Module (EFEM)
• This addition means that throughput is increased because wafers can be loaded automatically from cassettes and FOUPs